Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6075253 | Monocrystalline semiconductor photodetector | Mitsuhiro Sugiyama | 2000-06-13 |
| 6071797 | Method for forming amorphous carbon thin film by plasma chemical vapor deposition | Kazuhiko Endo | 2000-06-06 |
| 6060391 | Vapor phase growth method | — | 2000-05-09 |
| 6030894 | Method for manufacturing a semiconductor device having contact plug made of Si/SiGe/Si | Hiromitsu Hada, Naoki Kasai, Hidemitsu Mori | 2000-02-29 |
| 5946570 | Process for fabricating semiconductor device having semiconductor layers epitaxially grown from active areas without short-circuit on field insulating layer | Naoki Kasai, Hiromitsu Hada, Hidemitsu Mori | 1999-08-31 |
| 5909059 | Semiconductor device having contact plug and method for manufacturing the same | Hiromitsu Hada, Naoki Kasai, Hidemitsu Mori | 1999-06-01 |
| 5895948 | Semiconductor device and fabrication process thereof | Hidemitsu Mori, Hiromitsu Hada, Naoki Kasai | 1999-04-20 |
| 5866920 | Semiconductor device and manufacturing method of the same | Yoshishige Matsumoto, Yoshitake Ohnishi, Kazuhiko Endo | 1999-02-02 |
| 5723379 | Method for fabricating polycrystalline silicon having micro roughness on the surface | Hirohito Watanabe | 1998-03-03 |
| 5691249 | Method for fabricating polycrystalline silicon having micro roughness on the surface | Hirohito Watanabe | 1997-11-25 |
| 5623243 | Semiconductor device having polycrystalline silicon layer with uneven surface defined by hemispherical or mushroom like shape silicon grain | Hirohito Watanabe | 1997-04-22 |
| 5571735 | Method of manufacturing a semiconducter device capable of easily forming metal silicide films on source and drain regions | Tohru Mogami | 1996-11-05 |
| 5441012 | Thin film deposition method for wafer | Ken-ichi Aketagawa, Junro Sakai | 1995-08-15 |
| 5385863 | Method of manufacturing polysilicon film including recrystallization of an amorphous film | Akira Sakai | 1995-01-31 |
| 5366917 | Method for fabricating polycrystalline silicon having micro roughness on the surface | Hirohito Watanabe | 1994-11-22 |
| 5284521 | Vacuum film forming apparatus | Ken-ichi Aketagawa, Junro Sakai, Shun Murakami, Hiroyoshi Murota | 1994-02-08 |
| 5234862 | Thin film deposition method | Ken-ichi Aketagawa, Junro Sakai, Shun Murakami, Hiroyoshi Murota | 1993-08-10 |