Issued Patents All Time
Showing 51–72 of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6352813 | Photosensitive resin composition and patterning method using the same | Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa | 2002-03-05 |
| 6287746 | Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask | Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa | 2001-09-11 |
| 6248499 | (Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2001-06-19 |
| 6146806 | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2000-11-14 |
| 6140010 | Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2000-10-31 |
| 6106998 | Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2000-08-22 |
| 6074801 | Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2000-06-13 |
| 6030747 | Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask | Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa | 2000-02-29 |
| 5994025 | Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa | 1999-11-30 |
| 5985522 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa | 1999-11-16 |
| 5770346 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa | 1998-06-23 |
| 5747622 | Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 1998-05-05 |
| 5665518 | Photoresist and monomer and polymer for composing the photoresist | Kaichiro Nakano, Takeshi Ohfuji, Etsuo Hasegawa | 1997-09-09 |
| 5635332 | Alkylsulfonium salts and photoresist compositions containing the same | Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa | 1997-06-03 |
| 5585507 | Alkylsulfonium salts and photoresist compositions containing the same | Kaichiro Nakano, Shigeyuki Iwasa, Etsuo Hasegawa | 1996-12-17 |
| 5439990 | Photolytic polymer and photoresist composition | Kaichiro Nakano, Etsuo Hasegawa | 1995-08-08 |
| 5186912 | Controlled release dishwasher detergent dispenser | Richard E. Steindorf, Daniel K. Boche, Yoichi Satoh | 1993-02-16 |
| 4959692 | Developing device with retractable cutoff member | Yuji Hayashi, Susumu Sakakibara | 1990-09-25 |
| 4364680 | Ink ribbon feeder | — | 1982-12-21 |
| 4347919 | One revolution clutch assembly using gears | — | 1982-09-07 |
| 4309116 | Print head assembly of wire dot matrix printer | — | 1982-01-05 |
| 4219280 | Wire printer | — | 1980-08-26 |