Issued Patents All Time
Showing 26–50 of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8414733 | Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide | Kaichiro Nakano | 2013-04-09 |
| 7939241 | (Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method | Kaichirou Nakano | 2011-05-10 |
| 7847017 | Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide | Kaichiro Nakano | 2010-12-07 |
| 7829207 | Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate | Hiroyuki Kato, Michihiro Sano, Hiroshi Yoneyama, Takafumi Yao, Meoung Whan Cho | 2010-11-09 |
| 7470499 | Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition | Kaichiro Nakano | 2008-12-30 |
| 7439005 | Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern | Kaichiro Nakano | 2008-10-21 |
| 7438762 | Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate | Hiroyuki Kato, Michihiro Sano, Hiroshi Yoneyama, Takafumi Yao, Meoung Whan Cho | 2008-10-21 |
| 7432035 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2008-10-07 |
| 7378683 | Transistor using organic material having a bridged cyclic hydrocarbon lactone structure and process for producing the same | Hiroyuki Endoh, Etsuo Hasegawa, Satoru Toguchi | 2008-05-27 |
| 7232639 | Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same | Kaichiro Nakano | 2007-06-19 |
| 7192682 | Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation | Kaichiro Nakano | 2007-03-20 |
| 7186495 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2007-03-06 |
| 6924079 | Resist resin, chemical amplification type resist, and method of forming of pattern with the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2005-08-02 |
| 6849384 | Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2005-02-01 |
| 6746722 | Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition | Kaichiro Nakano | 2004-06-08 |
| 6710188 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | Kaichiro Nakano | 2004-03-23 |
| 6685416 | Bookbinding device and method | Katsuyasa Itoh, Masahiko Sakai, Motohiro Susa, Toshiaki Tsukahara, Maki Takimura +2 more | 2004-02-03 |
| 6639084 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | Kaichiro Nakano | 2003-10-28 |
| 6638685 | Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-10-28 |
| 6602647 | Sulfonium salt compound and resist composition and pattern forming method using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-08-05 |
| 6559337 | (Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-05-06 |
| 6528232 | Sulfonium salt compound, photoresist composition and method for patterning by employing same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-03-04 |
| 6469197 | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2002-10-22 |
| 6437052 | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same | Shigeyuki Iwasa, Etsuo Hasegawa | 2002-08-20 |
| 6391529 | (Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2002-05-21 |