KT

Kuen-Yu Tsai

NU National Taiwan University: 14 patents #28 of 2,195Top 2%
TSMC: 12 patents #2,442 of 12,232Top 20%
AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
SU Stanford University: 1 patents #58 of 261Top 25%
📍 Taipei, CA: #136 of 623 inventorsTop 25%
Overall (All Time): #264,664 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
12308368 Method for non-resist nanolithography Miin-Jang Chen, Chee-Wee Liu 2025-05-20
11855190 Methods for non-resist nanolithography Miin-Jang Chen, Chee-Wee Liu 2023-12-26
11532729 Method for non-resist nanolithography Miin-Jang Chen, Chee-Wee Liu 2022-12-20
10665696 Method for non-resist nanolithography Miin-Jang Chen, Chee-Wee Liu 2020-05-26
10615036 Charged-particle-beam patterning without resist Miin-Jang Chen, Samuel C. Pan 2020-04-07
10007752 Determining proximity effect parameters for non rectangular semiconductor structures Meng-Fu You, Yi LU 2018-06-26
9972702 Method for non-resist nanolithography Miin-Jang Chen, Chee-Wee Liu 2018-05-15
9934969 Charged-particle-beam patterning without resist Miin-Jang Chen, Samuel C. Pan 2018-04-03
9570301 Projection patterning with exposure mask Miin-Jang Chen, Si-Chen Lee 2017-02-14
9541500 Method for calibrating a manufacturing process model Alek Chi-Heng Chen, Jia Li 2017-01-10
9418049 Method and system for establishing parametric model Chun-Hung Liu 2016-08-16
9087173 Determining proximity effect parameters for non-rectangular semiconductor structures Meng-Fu You, Yi LU 2015-07-21
8578303 Method for compensating effect of patterning process and apparatus thereof Chooi-Wan Ng, Yi-Sheng Su 2013-11-05
8539392 Method for compensating proximity effects of particle beam lithography processes Chun-Hung Liu, Philip C. W. Ng, Pei-Lin Tien 2013-09-17
8490033 Method and apparatus for designing patterning system based on patterning fidelity Sheng-Yung Chen, Hoi-Tou Ng, Shiau-Yi Ma 2013-07-16
8438505 Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects Wei-Jhih Hsieh, Bo-Sen Chang 2013-05-07
6992542 Method for fast design of multi-objective frequency-shaping equalizers 2006-01-31