Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7358576 | Word line structure with single-sided partially recessed gate structure | Shih-Fan Kuan | 2008-04-15 |
| 7115491 | Method for forming self-aligned contact in semiconductor device | Tse-Yao Huang, Yi-Nan Chen | 2006-10-03 |
| 7075138 | Bitline structure for DRAM and method of forming the same | — | 2006-07-11 |
| 7052949 | Method for forming bit line | Tse-Yao Huang, Yi-Nan Chen | 2006-05-30 |
| 7033885 | Deep trench structure manufacturing process | Ping Hsu | 2006-04-25 |
| 7030011 | Method for avoiding short-circuit of conductive wires | Ping Hsu | 2006-04-18 |
| 6991978 | World line structure with single-sided partially recessed gate structure | Shih-Fan Kuan | 2006-01-31 |
| 6979613 | Method for fabricating a trench capacitor of DRAM | Ping Hsu | 2005-12-27 |
| 6972248 | Method of fabricating semiconductor device | Sweehan J. H. Yang, Shih-Fan Kuan | 2005-12-06 |
| 6960530 | Method of reducing the aspect ratio of a trench | Chang-Rong Wu, Yi-Nan Chen, Hung-Chang Liao | 2005-11-01 |
| 6960503 | Method for fabricating a trench capacitor | Ping Hsu, Shih-Fan Kuan | 2005-11-01 |
| 6953725 | Method for fabricating memory device having a deep trench capacitor | Ping Hsu | 2005-10-11 |
| 6943099 | Method for manufacturing gate structure with sides of its metal layer partially removed | Shih-Fan Kuan | 2005-09-13 |
| 6933229 | Method of manufacturing semiconductor device featuring formation of conductive plugs | Shih-Fan Kuan | 2005-08-23 |
| 6930043 | Method for forming DRAM cell bit line and bit line contact structure | Shih-Fan Kuan | 2005-08-16 |
| 6797564 | Method of forming bit lines and bit line contacts in a memory device | Yi-Nan Chen | 2004-09-28 |
| 6797611 | Method of fabricating contact holes on a semiconductor chip | Yinan Chen | 2004-09-28 |
| 6790771 | Bitline structure for DRAM and method of forming the same | — | 2004-09-14 |
| 6743717 | Method for forming silicide at source and drain | Jeng-Ping Lin | 2004-06-01 |
| 5888904 | Method for manufacturing polysilicon with relatively small line width | — | 1999-03-30 |