Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9625832 | Planar motor system with increased efficiency | J. Casey Donaher, Peter John Gerard Dufault | 2017-04-18 |
| 8395783 | System metrology core | J. Casey Donaher, Roger McCleary | 2013-03-12 |
| 6483572 | Reticle alignment system for use in lithography | Mark Lucas | 2002-11-19 |
| 6320644 | Reticle alignment system for use in lithography | Marc S. Lucas | 2001-11-20 |
| 5828142 | Platen for use with lithographic stages and method of making same | — | 1998-10-27 |
| 5677758 | Lithography System using dual substrate stages | Robert A. McEachern, Mark Lucas | 1997-10-14 |
| 4855792 | Optical alignment system for use in photolithography and having reduced reflectance errors | David S. Holbrook | 1989-08-08 |