Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8610033 | Rapid thermal process reactor utilizing a low profile dome | Katsuhito Nishikawa, Steven C. Beese | 2013-12-17 |
| 7794667 | Gas ring and method of processing substrates | Katsuhito Nishikawa, Aaron David Ingles | 2010-09-14 |
| 6799603 | Gas flow controller system | — | 2004-10-05 |
| 6773749 | Method of controlling gas flow to a semiconductor processing reactor | — | 2004-08-10 |
| 6475284 | Gas dispersion head | Katsuhito Nishikawa | 2002-11-05 |
| 6428609 | Exhaust particulate controller and method | Katsuhito Nishikawa | 2002-08-06 |
| 6347749 | Semiconductor processing reactor controllable gas jet assembly | Katsuhito Nishikawa | 2002-02-19 |
| 6328221 | Method for controlling a gas injector in a semiconductor processing reactor | Katsuhito Nishikawa | 2001-12-11 |
| 6310327 | Rapid thermal processing apparatus for processing semiconductor wafers | Katsuhito Nishikawa | 2001-10-30 |
| 6169244 | Thermocouple sheath cover | Thomas F. Carlos | 2001-01-02 |
| 6163015 | Substrate support element | Katsuhito Nishikawa, Kazutoshi Inoue | 2000-12-19 |
| 6151447 | Rapid thermal processing apparatus for processing semiconductor wafers | Katsuhito Nishikawa | 2000-11-21 |
| 6110289 | Rapid thermal processing barrel reactor for processing substrates | — | 2000-08-29 |
| 5872632 | Cluster tool layer thickness measurement apparatus | — | 1999-02-16 |
| 5820686 | Multi-layer susceptor for rapid thermal process reactors | — | 1998-10-13 |
| 5801961 | Power management system for a semiconductor processing facility | Michael Peterson, Steven C. Beese | 1998-09-01 |
| 5802099 | Method for measuring substrate temperature in radiant heated reactors | William J. Curran | 1998-09-01 |
| 5710407 | Rapid thermal processing apparatus for processing semiconductor wafers | Katsuhito Nishikawa | 1998-01-20 |
| 5683518 | Rapid thermal processing apparatus for processing semiconductor wafers | Katsuhito Nishikawa | 1997-11-04 |
| 5601107 | Automated process gas supply system for evacuating a process line | Richard S. Pairish | 1997-02-11 |
| 5580388 | Multi-layer susceptor for rapid thermal process reactors | — | 1996-12-03 |
| 5444217 | Rapid thermal processing apparatus for processing semiconductor wafers | Katsuhito Nishikawa | 1995-08-22 |
| 5417236 | Automated process gas supply system for evacuating a process line | Richard S. Pairish | 1995-05-23 |
| 5240024 | Automated process gas supply system for evacuating a process line | Richard S. Pairish | 1993-08-31 |
| 5207835 | High capacity epitaxial reactor | — | 1993-05-04 |