Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6420763 | Semiconductor device having a retrograde well structure and method of manufacturing thereof | Tomohiro Yamashita, Shigeki Komori | 2002-07-16 |
| 5852327 | Semiconductor device | Shigeki Komori, Tomohiko YAMASHITA | 1998-12-22 |
| 5648284 | Field effect transistor including silicon oxide film and nitrided oxide film as gate insulator film and manufacturing method thereof | Shigeru Kusunoki | 1997-07-15 |
| 5554876 | Field effect transistor including silicon oxide film and nitrided oxide film as gate insulator film and manufacturing method thereof | Shigeru Kusunoki | 1996-09-10 |
| 5536665 | Method of manufacturing a semiconductor device with double structured well | Shigeki Komori, Takashi Kuroi | 1996-07-16 |
| 5446305 | Semiconductor device with double structured well | Shigeki Komori, Takashi Kuroi | 1995-08-29 |
| 5369297 | Field effect transistor including silicon oxide film and nitrided oxide film as gate insulator film and manufacturing method thereof | Shigeru Kusunoki | 1994-11-29 |
| 5268321 | Method of making DRAM cell having improved radiation protection | Masahiro Shimizu, Hiroki Shimano, Katsuhiro Tsukamoto | 1993-12-07 |
| 5258319 | Method of manufacturing a MOS type field effect transistor using an oblique ion implantation step | Katsuhiro Tsukamoto | 1993-11-02 |
| 5258321 | Manufacturing method for semiconductor memory device having stacked trench capacitors and improved intercell isolation | Masahiro Shimizu, Katsuhiro Tsukamoto | 1993-11-02 |
| 5217913 | Method of manufacturing an MIS device having lightly doped drain structure and conductive sidewall spacers | Kiyoto Watabe, Katsuyoshi Mitsui | 1993-06-08 |
| 5200353 | Method of manufacturing a semiconductor device having trench capacitor | — | 1993-04-06 |
| 5200918 | Static semiconductor memory with polysilicon source drain transistors | Tomohisa Wada | 1993-04-06 |
| 5183771 | Method of manufacturing LDDFET having double sidewall spacers | Katsuyoshi Mitsui | 1993-02-02 |
| 5166763 | Static type semiconductor memory device and method of manufacturing thereof | Tomohisa Wada | 1992-11-24 |
| 5146291 | MIS device having lightly doped drain structure | Kiyoto Watabe, Katsuyoshi Mitsui | 1992-09-08 |
| 5089865 | MIS semiconductor device | Katsuyoshi Mitsui | 1992-02-18 |
| 5061975 | MOS type field effect transistor having LDD structure | Katsuhiro Tsukamoto | 1991-10-29 |
| 5023682 | Semiconductor memory device | Masahiro Shimizu, Hiroki Shimano, Katsuhiro Tsukamoto | 1991-06-11 |
| 4942448 | Structure for isolating semiconductor components on an integrated circuit and a method of manufacturing therefor | Katsuhiro Tsukamoto, Masahiro Shimizu | 1990-07-17 |
| 4918500 | Semiconductor device having trench capacitor and manufacturing method therefor | — | 1990-04-17 |
| 4702797 | Method of manufacturing semiconductor memory device | Hiroki Shimano, Masahiro Shimizu, Katsuhiro Tsukamoto | 1987-10-27 |