Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6960264 | Process for fabricating films of uniform properties on semiconductor devices | Garry Mercaldi | 2005-11-01 |
| 6949789 | Use of dilute steam ambient for improvement of flash devices | Ronald A. Weimer, John T. Moore, Jeff McKee | 2005-09-27 |
| 6890867 | Transistor fabrication methods comprising selective wet-oxidation | — | 2005-05-10 |
| 6837938 | Apparatus associatable with a deposition chamber to enhance uniformity of properties of material layers formed on semiconductor substrates therein | Garry Mercaldi | 2005-01-04 |
| 6833280 | Process for fabricating films of uniform properties on semiconductor devices | Garry Mercaldi | 2004-12-21 |
| 6825522 | Capacitor electrode having an interface layer of different chemical composition formed on a bulk layer | Scott DeBoer | 2004-11-30 |
| 6787479 | Method for producing water for use in manufacturing semiconductors | — | 2004-09-07 |
| 6784124 | Methods of selective oxidation conditions for dielectric conditioning | Ronald A. Weimer | 2004-08-31 |
| 6774443 | System and device including a barrier layer | Garry Mercaldi, Ronald A. Weimer | 2004-08-10 |
| 6770574 | Method of forming a dielectric layer | Garry Mercaldi | 2004-08-03 |
| 6734531 | Use of selective oxidation conditions for dielectric conditioning | Ronald A. Weimer | 2004-05-11 |
| 6670231 | Method of forming a dielectric layer in a semiconductor device | Garry Mercaldi | 2003-12-30 |
| 6649278 | Process for fabricating films of uniform properties on semiconductor devices | Garry Mercaldi | 2003-11-18 |
| 6620742 | In-situ use of dichloroethene and NH3 in an H2O steam based oxidation system to provide a source of chlorine | — | 2003-09-16 |
| 6617624 | Metal gate electrode stack with a passivating metal nitride layer | — | 2003-09-09 |
| 6576979 | Use of selective oxidation conditions for dielectric conditioning | Ronald A. Weimer | 2003-06-10 |
| 6576964 | Dielectric layer for a semiconductor device having less current leakage and increased capacitance | Garry Mercaldi | 2003-06-10 |
| 6555487 | Method of selective oxidation conditions for dielectric conditioning | Ronald A. Weimer | 2003-04-29 |
| 6537677 | Process for fabricating films of uniform properties on semiconductor devices | Garry Mercaldi | 2003-03-25 |
| 6475883 | Method for forming a barrier layer | Garry Mercaldi, Ronald A. Weimer | 2002-11-05 |
| 6471780 | Process for fabricating films of uniform properties on semiconductor devices | Garry Mercaldi | 2002-10-29 |
| 6458714 | Method of selective oxidation in semiconductor manufacture | Ron Weimer, Lyle Breiner, Howard Rhodes, Jeff McKee, David J. Kubista | 2002-10-01 |
| 6451714 | System and method for selectively increasing surface temperature of an object | — | 2002-09-17 |
| 6440382 | Method for producing water for use in manufacturing semiconductors | — | 2002-08-27 |
| 6423617 | In-situ use of dichloroethene and NH3 in an H2O steam based oxidation system to provide a source of chlorine | — | 2002-07-23 |