Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9394104 | Material delivery method and system | Mike Hamilton | 2016-07-19 |
| 6403925 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 2002-06-11 |
| 6399921 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 2002-06-04 |
| 6301434 | Apparatus and method for CVD and thermal processing of semiconductor substrates | Kristian E. Johnsgard, Steven E. Parks, Mark Johnsgard | 2001-10-09 |
| 6200634 | Thermal processing system with supplemental resistive heater and shielded optical pyrometry | Kristian E. Johnsgard | 2001-03-13 |
| 6172337 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 2001-01-09 |
| 6046439 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 2000-04-04 |
| 6043460 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 2000-03-28 |
| 6002109 | System and method for thermal processing of a semiconductor substrate | Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin | 1999-12-14 |
| 5830277 | Thermal processing system with supplemental resistive heater and shielded optical pyrometry | Kristian E. Johnsgard | 1998-11-03 |
| 5493987 | Chemical vapor deposition reactor and method | Kristian E. Johnsgard | 1996-02-27 |
| 5242501 | Susceptor in chemical vapor deposition reactors | — | 1993-09-07 |
| 5148714 | Rotary/linear actuator for closed chamber, and reaction chamber utilizing same | — | 1992-09-22 |
| 4823735 | Reflector apparatus for chemical vapor deposition reactors | Marlowe A. Pichel, Glenn A. Pfefferkorn, Roger P. Cory | 1989-04-25 |
| 4632058 | Apparatus for uniform chemical vapor deposition | Robert E. Dixon, Jr. | 1986-12-30 |