| 9394104 |
Material delivery method and system |
Mike Hamilton |
2016-07-19 |
| 6403925 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
2002-06-11 |
| 6399921 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
2002-06-04 |
| 6301434 |
Apparatus and method for CVD and thermal processing of semiconductor substrates |
Kristian E. Johnsgard, Steven E. Parks, Mark Johnsgard |
2001-10-09 |
| 6200634 |
Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
Kristian E. Johnsgard |
2001-03-13 |
| 6172337 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
2001-01-09 |
| 6046439 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
2000-04-04 |
| 6043460 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
2000-03-28 |
| 6002109 |
System and method for thermal processing of a semiconductor substrate |
Kristian E. Johnsgard, Brad S. Mattson, Vladimir J. Zeitlin |
1999-12-14 |
| 5830277 |
Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
Kristian E. Johnsgard |
1998-11-03 |
| 5493987 |
Chemical vapor deposition reactor and method |
Kristian E. Johnsgard |
1996-02-27 |
| 5242501 |
Susceptor in chemical vapor deposition reactors |
— |
1993-09-07 |
| 5148714 |
Rotary/linear actuator for closed chamber, and reaction chamber utilizing same |
— |
1992-09-22 |
| 4823735 |
Reflector apparatus for chemical vapor deposition reactors |
Marlowe A. Pichel, Glenn A. Pfefferkorn, Roger P. Cory |
1989-04-25 |
| 4632058 |
Apparatus for uniform chemical vapor deposition |
Robert E. Dixon, Jr. |
1986-12-30 |
