MS

Martin Schlott

LG Leybold Materials Gmbh: 6 patents #1 of 10Top 10%
MG Materion Advanced Materials Germany Gmbh: 4 patents #1 of 9Top 15%
HD Heraeus Deutschland: 3 patents #48 of 333Top 15%
HK Heraeus Materials Technology Gmbh & Co. Kg: 1 patents #7 of 25Top 30%
📍 Offenbach, DE: #17 of 243 inventorsTop 7%
Overall (All Time): #340,954 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
11566320 NiW(X) sputtering target with improved structure Markus Schultheis 2023-01-31
11125708 Silver alloy-based sputter target Christoph Simons, Albert Kastner, Jens Wagner, Uwe Konietzka 2021-09-21
10487392 Double-layer system comprising a partially absorbing layer, and method and sputter target for producing said layer Albert Kastner, Markus Schultheis, Jens Wagner 2019-11-26
9960022 Sputtering target with optimized performance characteristics Carl Christoph Stahr 2018-05-01
9334564 Tube-shaped sputtering target Christoph Simons, Josef Heindel, Christoph Stahr 2016-05-10
9051646 Sputtering target having amorphous and microcrystalline portions and method of producing same Andreas Herzog, Sabine Schneider-Betz, Christoph Stahr 2015-06-09
8974707 Planar or tubular sputtering target and method for the production thereof Sabine Schneider-Betz, Uwe Konietzka, Markus Schultheis, Ben KAHLE, Lars Ebel 2015-03-10
8581248 Thin film transistor (TFT) having copper electrodes Sabine Schneider-Betz 2013-11-12
6372104 Cobalt base alloy sputtering target with high magnetic field penetration Josef Heindel 2002-04-16
6187253 Method of preparing indium oxide/tin oxide target for cathodic sputtering Wolfgang Dauth, Martin Kutzner, Bruce Gehman, Shawn Vahlstrom 2001-02-13
5728279 Cobalt base alloy target for a magnetron cathode sputtering system Martin Weigert, Kwei Teng, Bruce Gehman 1998-03-17
5660599 Process for the recycling of spent indium oxide-tin oxide sputtering targets Wolfgang Dauth, Martin Kutzner 1997-08-26
5531948 Process for the production of partially reduced indium oxide-tin oxide targets Martin Kutzner, Martin Weigert, Wolfgang Dauth, Bruce Gehman 1996-07-02
5480532 Sputter target for cathodic atomization to produce transparent, conductive layers Martin Kutzner, Martin Weigert, Uwe Konietzka, Bruce Gehman, Shawn Vahlstrom 1996-01-02