Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440281 | Device for the prevention of arcing in vacuum sputtering installations | Johann Sturmer, Michael Lubbehusen | 2002-08-27 |
| 5206588 | Apparatus and process for the non-destructive measurement of the ohmic resistance of a thin layer using eddy currents | — | 1993-04-27 |
| 5051599 | Device for recognizing the impact site of a charge carrier beam on a target | Ewald Benes, Martin Groschl, Michael Schmid, Hans-Joachim Siegmund, Friedrich-Werner Thomas | 1991-09-24 |
| 4973818 | Device and method for the control and monitoring of an electron beam for metal working | Harald Bittenbrunn, Friedrich-Werner Thomas | 1990-11-27 |
| 4968947 | Apparatus for the non-destructive measurement of the ohmic resistance of thin layers | — | 1990-11-06 |
| 4958131 | Circuit arrangement for the combined application of an inductive and capacitative device for the non-destructive measurement of the ohmic resistance of thin layers | — | 1990-09-18 |
| 4843246 | Apparatus for detecting the position of incidence of a beam of charge carriers on a target | Ewald Benes, Franz Viehbock, Herbert Stori, Friedrich-Werner Thomas | 1989-06-27 |
| 4817430 | System for determining the thickness of varying material coatings | Ewald Benes, Paul Berlinger | 1989-04-04 |
| 4700281 | Direct-current-alternating-current inverter comprising a load which gains by forcing an output voltage of the direct-current-alternating-current inverter having a defined wave shape and frequency | Friedrich-Werner Thomas, Johann Sturmer, Dietrich Dahlinger, Guido Hubertus, Wolfgang Sperzel | 1987-10-13 |
| 4682105 | Apparatus for electrically contactlessly measuring the thickness of electrically conducting thin films on non-conducting travelling webs in vacuum deposition apparatus | — | 1987-07-21 |
| 4627989 | Method and system for a vacuum evaporative deposition process | Albert Feuerstein, Horst Ranke | 1986-12-09 |
| 4207835 | Arrangement and photometer for measuring and controlling the thickness of optically active thin layers | Horst Schwiecker, Hans-Peter Ehrl | 1980-06-17 |