RO

Robert O'Donnell

Lam Research: 39 patents #52 of 2,128Top 3%
📍 San Francisco, CA: #708 of 26,999 inventorsTop 3%
🗺 California: #11,767 of 386,348 inventorsTop 4%
Overall (All Time): #82,864 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
6852636 Insitu post etch process to remove remaining photoresist and residual sidewall passivation 2005-02-08
6830622 Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof John Daugherty 2004-12-14
6790242 Fullerene coated component of semiconductor processing equipment and method of manufacturing thereof Christopher C. Chang, John Daugherty 2004-09-14
6780787 Low contamination components for semiconductor processing apparatus and methods for making components 2004-08-24
6773751 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof John Daugherty, Christopher C. Chang 2004-08-10
6620520 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof Christopher C. Chang, John Daugherty 2003-09-16
6613442 Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof John Daugherty, Christopher C. Chang 2003-09-02
6537429 Diamond coatings on reactor wall and method of manufacturing thereof John Daugherty, Christopher C. Chang 2003-03-25
6533910 Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof John Daugherty, Christopher C. Chang 2003-03-18
6475298 Post-metal etch treatment to prevent corrosion Gregory J. Goldspring 2002-11-05
6296778 Method and apparatus for simulating standard test wafers Gregory J. Goldspring 2001-10-02
6242107 Methods for etching an aluminum-containing layer 2001-06-05
6069035 Techniques for etching a transition metal-containing layer Gregory J. Goldspring 2000-05-30
5994235 Methods for etching an aluminum-containing layer 1999-11-30