Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6429144 | Integrated circuit manufacture method with aqueous hydrogen fluoride and nitric acid oxide etch | Landon B. Vines, Felix Fujishiro | 2002-08-06 |
| 6007641 | Integrated-circuit manufacture method with aqueous hydrogen-fluoride and nitric-acid oxide etch | Landon B. Vines, Felix Fujishiro | 1999-12-28 |
| 5847465 | Contacts for semiconductor devices | Fu-Tai Liou | 1998-12-08 |
| 5821558 | Antifuse structures | Ying-Tsong Loh, Ivan Sanchez | 1998-10-13 |
| 5821136 | Inverted field-effect device with polycrystalline silicon/germanium channel | Tsiu C. Chan, Elmer H. Guritz, Richard A. Blanchard | 1998-10-13 |
| 5801396 | Inverted field-effect device with polycrystalline silicon/germanium channel | Tsiu C. Chan, Elmer H. Guritz, Richard A. Blanchard | 1998-09-01 |
| 5793094 | Methods for fabricating anti-fuse structures | Ivan Sanchez, Ying-Tsong Loh, Walter D. Parmantie | 1998-08-11 |
| 5793640 | Capacitance measurement using an RLC circuit model | Koucheng Wu, Ying-Tsong Loh | 1998-08-11 |
| 5789795 | Methods and apparatus for fabricationg anti-fuse devices | Ivan Sanchez, Miguel A. Delgado, Ying-Tsong Loh | 1998-08-04 |
| 5783467 | Method of making antifuse structures using implantation of both neutral and dopant species | Ying-Tsong Loh, Ivan Sanchez | 1998-07-21 |
| 5773317 | Test structure and method for determining metal-oxide-silicon field effect transistor fringing capacitance | Koucheng Wu, Ying-Tsong Loh | 1998-06-30 |
| 5770892 | Field effect device with polycrystalline silicon channel | Tsiu C. Chan, Elmer H. Guritz | 1998-06-23 |
| 5753540 | Apparatus and method for programming antifuse structures | Koucheng Wu, Ivan Sanchez, Ying-Tsong Loh | 1998-05-19 |
| 5444008 | High-performance punchthrough implant method for MOS/VLSI | Samuel J. S. Nagalingam | 1995-08-22 |
| 5409848 | Angled lateral pocket implants on p-type semiconductor devices | Samuel J. S. Nagalingam | 1995-04-25 |
| 5395773 | MOSFET with gate-penetrating halo implant | K. S. Ravindhran, Ravi Jhota, Walter D. Parmantie | 1995-03-07 |
| 5371041 | Method for forming a contact/VIA | Fu-Tai Liou, Robert O. Miller, Mohammed M. Farohani | 1994-12-06 |
| 5344787 | Latid implants for increasing the effective width of transistor elements in a semiconductor device | Samuel J. S. Nagalingam, Ravi Jhota | 1994-09-06 |
| 5256895 | Pad oxide protect sealed interface isolation | Frank R. Bryant, Fu-Tai Liou | 1993-10-26 |
| 5135888 | Field effect device with polycrystalline silicon channel | Tsiu C. Chan, Elmer H. Guritz | 1992-08-04 |
| 4981813 | Pad oxide protect sealed interface isolation process | Frank R. Bryant, Fu-Tai Liou, Tsiu C. Chan | 1991-01-01 |
| 4962414 | Method for forming a contact VIA | Fu-Tai Liou, Robert O. Miller, Mohammed M. Farohani | 1990-10-09 |
| 4868138 | Method for forming a self-aligned source/drain contact for an MOS transistor | Tsiu C. Chan | 1989-09-19 |
| RE32800 | Method of making mosfet by multiple implantations followed by a diffusion step | Tsiu C. Chan | 1988-12-13 |
| 4771014 | Process for manufacturing LDD CMOS devices | Fu-Tai Liou, Frank R. Bryant | 1988-09-13 |