YL

Yen-Cheng Li

EU Everlight Usa: 12 patents #2 of 103Top 2%
IT ITRI: 4 patents #1,876 of 9,619Top 20%
EI Everlight Chemical Industrial: 1 patents #19 of 47Top 45%
📍 New Taipei, TW: #752 of 10,472 inventorsTop 8%
Overall (All Time): #272,053 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDate
11472961 Polymer, metal removal composition, and method of removing metal ions Min-Fei Tsai, Feng-Jen Tsai, Ping-Yen Chen, Li-Han Chung 2022-10-18
11084262 Polyamide composition and film and method for manufacturing the same Jyh-Horng Wu, Ming-Tsong Leu, Sheng-Lung CHANG, Hung-Jen Liu, Po-Ling Shiao +1 more 2021-08-10
10710028 Multilayer composite membrane Li-Han Chung, Min-Fei Tsai, Guan-You Lin 2020-07-14
10601013 Composite film and manufacturing method for the same and battery comprising composite film Chih-Hung Lee, Ang-Ta Tsai 2020-03-24
9170491 Negative-type photoresist composition for thick film and use thereof Yi Chen, Nai-Tien Chou, Hsin-Yi Huang 2015-10-27
8138276 Silicone containing encapsulant Tsung-Yi Chao, Wen-Jeng Lee, Der-Gun Chou, Meng-Huang Yan 2012-03-20
7915322 Polymerizable water-soluble or alcohol-soluble ultraviolet absorber Chiu-Ming Hung, Wei-Ju Chen, Cheng-Han Chung, Chih-Kang Chang, Hsiang-Lin Jiang +2 more 2011-03-29
7879786 Detergent composition Yung-Hsiang Bai, Yu-Fen Liao, Yi-Jin Chen 2011-02-01
6720430 Monomer for chemical amplified photoresist compositions Chi-Sheng Chen, Meng-Hsum Cheng 2004-04-13
6703178 Chemical amplified photoresist compositions Chi-Sheng Chen, Meng-Hsum Cheng 2004-03-09
6639035 Polymer for chemical amplified photoresist compositions Chi-Sheng Chen, Meng-Hsum Cheng 2003-10-28
6441115 Photosensitive polymer Shang-Wern Chang, Shang-Ho Lin 2002-08-27
6376700 Alicyclic compound Shang-Wern Chang, Shang-Ho Lin, Wen-Chieh Wang 2002-04-23
6316159 Chemical amplified photoresist composition Shang-Wern Chang, Shang-Ho Lin 2001-11-13
6294309 Positive photoresist composition containing alicyclic dissolution inhibitors Shang-Wern Chang, Shang-Ho Lin, Wen-Chieh Wang 2001-09-25
6271412 Photosensitive monomer Shang-Wern Chang, Shang-Ho Lin 2001-08-07
6265131 Alicyclic dissolution inhibitors and positive potoresist composition containing the same Shang-Wern Chang, Shang-Ho Lin, Wen-Chieh Wang 2001-07-24