Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE48287 | Method for forming an optical fiber array | Guido De Boer, Ralph Van Melle, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2020-10-27 |
| 10692696 | Deflection scan speed adjustment during charged particle exposure | Marco Jan-Jaco Wieland | 2020-06-23 |
| 10297420 | Charged particle lithography system | Marco Jan-Jaco Wieland | 2019-05-21 |
| 9978562 | Method for exposing a wafer | Marco Jan-Jaco Wieland | 2018-05-22 |
| 9691589 | Dual pass scanning | Marco Jan-Jaco Wieland | 2017-06-27 |
| 9457549 | Method for forming an optical fiber array | Guido De Boer, Ralph Van Melle, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2016-10-04 |
| 9455122 | Modulation device and power supply arrangement | Hendrik Den Boer | 2016-09-27 |
| 9305747 | Data path for lithography apparatus | Marco Jan-Jaco Wieland, Floris Pepijn van der Wilt, Ernst Habekotte | 2016-04-05 |
| 9287081 | Lithography system, modulation device and method of manufacturing a fiber fixation substrate | Ralph Van Melle, Henk Derks | 2016-03-15 |
| 9036962 | Arrangement of optical fibers, and a method of forming such arrangement | Guido De Boer, Ralph Van Melle, Henk Derks, Frederik Matthias Spiegelhalder, Roy Josephus Stephanus Derks +1 more | 2015-05-19 |
| 8921758 | Modulation device and charged particle multi-beamlet lithography system using the same | Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Remco Jager, Stijn Willem Herman Karel Steenbrink, Ralph Van Melle +1 more | 2014-12-30 |
| 8884255 | Data path for lithography apparatus | Henk Derks, Marco Jan-Jaco Wieland | 2014-11-11 |
| 8710465 | Pattern data conversion for lithography system | Marco Jan-Jaco Weiland | 2014-04-29 |
| 8604411 | Charged particle beam modulator | Marco Jan-Jaco Wieland, Remco Jager, Alexander Hendrik Vincent Van Veen, Stijn Willem Herman Karel Steenbrink, Henk Derks | 2013-12-10 |
| 8598544 | Method of generating a two-level pattern for lithographic processing and pattern generator using the same | Marco Jan-Jaco Wieland | 2013-12-03 |