Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8293460 | Double exposure patterning with carbonaceous hardmask | Hui-Wan Chen, Chorng-Ping Chang, Yongmei Chen, Huixiong Dai, Jiahua Yu +7 more | 2012-10-23 |
| 7817289 | Methods and apparatus for measuring thickness of etching residues on a substrate | — | 2010-10-19 |
| 7459319 | Method and apparatus for characterizing features formed on a substrate | Michael C. Smayling, Michael Duane | 2008-12-02 |
| 7196350 | Method and apparatus for characterizing features formed on a substrate | Michael C. Smayling, Michael Duane | 2007-03-27 |