Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8426087 | Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method | Ayumi Minamide, Akemi Moniwa, Manabu Ishibashi | 2013-04-23 |
| 8367309 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Akemi Moniwa | 2013-02-05 |
| 8071264 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Akemi Moniwa | 2011-12-06 |
| 7935462 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask | Akemi Moniwa | 2011-05-03 |
| 7682760 | Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask | Akemi Moniwa | 2010-03-23 |