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Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
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2019-08-27 |
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Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
Vijay Immanuel Raman, Yuzhuo Li, Yongqing Lan, Kenneth Rushing, Karpagavalli Ramji |
2015-05-12 |
| 9005472 |
Aqueous polishing agent and graft copolymers and their use in a process for polishing patterned and unstructured metal surfaces |
Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Maxim Peretolchin |
2015-04-14 |
| 8927429 |
Chemical mechanical polishing (CMP) composition comprising a specific heteropolyacid |
Christine Schmitt, Andrey Karpov, Frank Rosowski, Yuzhuo Li |
2015-01-06 |
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Aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces |
Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Yongqing Lan |
2014-06-10 |
| 8679980 |
Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process |
Vijay Immanuel Raman, Ilshat Gubaydullin, Yuzhuo Li, Yongqing Lan |
2014-03-25 |
| 8288512 |
Use of amphiphilic self-assembling proteins for formulating poorly water-soluble effect substances |
Burghard Liebmann, Marcus Fehr, Daniel Hümmerich, Ingrid Martin, Arne Ptock +1 more |
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