| 7361530 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
Tsuneo Terasawa, Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori |
2008-04-22 |
| 7205222 |
Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
Tsuneo Terasawa, Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori |
2007-04-17 |
| 6958292 |
Method of manufacturing integrated circuit |
Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori |
2005-10-25 |
| 6936406 |
Method of manufacturing integrated circuit |
Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori |
2005-08-30 |
| 6902868 |
Method of manufacturing integrated circuit |
Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori |
2005-06-07 |
| 6849540 |
METHOD OF FABRICATING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND METHOD OF PRODUCING A MULTI-CHIP MODULE THAT INCLUDES PATTERNING WITH A PHOTOMASK THAT USES METAL FOR BLOCKING EXPOSURE LIGHT AND A PHOTOMASK THAT USES ORGANIC RESIN FOR BLOCKING EXPOSURE LIGHT |
Tsuneo Terasawa, Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori |
2005-02-01 |
| 6846598 |
Manufacturing method of photomask and photomask |
Norio Hasegawa, Toshihiko Tanaka, Joji Okada, Kazutaka Mori |
2005-01-25 |
| 6794207 |
Method of manufacturing integrated circuit |
Norio Hasegawa, Joji Okada, Toshihiko Tanaka, Kazutaka Mori |
2004-09-21 |
| 6665858 |
Manufacturing method of semiconductor device |
— |
2003-12-16 |
| 6656644 |
Manufacturing method of photomask and photomask |
Norio Hasegawa, Toshihiko Tanaka, Joji Okada, Kazutaka Mori |
2003-12-02 |
| 6622292 |
Design method for logic circuit, design support system for logic circuit and readable media |
Kazuhiko Eguchi, Tadaaki Tanimoto |
2003-09-16 |
| 6596656 |
Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM |
Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori, Tsuneo Terasawa |
2003-07-22 |
| 5159664 |
Graphic display apparatus |
Tetsuya Yamamoto, Goro Suzuki, Susumu Sugawara, Nobuhiro Hamada, Tsuyoshi Takahashi +2 more |
1992-10-27 |