Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10722999 | High removal rate chemical mechanical polishing pads and methods of making | Thomas P. Willumstad, Bainian Qian, Rui Xie, George C. Jacob, Marty W. DeGroot | 2020-07-28 |
KO
Kenjiro Ogata
Nitta Haas: 1 patents #22 of 56Top 40%
Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #157 of 239Top 70%
Overall (All Time): #2,805,001 of 4,157,543Top 70%
1
Patents All Time