Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5296093 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Chester A. Szwejkowski, Ian Latchford, Isamu Namose | 1994-03-22 |
| 5147499 | Process for removal of residues remaining after etching polysilicon layer in formation of integrated circuit structure | Chester A. Szwejkowski, Ian Latchford, Isamu Namose | 1992-09-15 |