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Jeffrey Robert Stack

RH Rohm And Haas Electronic Materials Cmp Holdings: 7 patents #41 of 239Top 20%
📍 Clayton, DE: #3 of 16 inventorsTop 20%
🗺 Delaware: #1,358 of 7,163 inventorsTop 20%
Overall (All Time): #719,608 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
10857648 Trapezoidal CMP groove pattern John Nguyen, Tony Quan Tran, Jeffrey James Hendron 2020-12-08
10857647 High-rate CMP polishing method John Nguyen, Tony Quan Tran, Jeffrey James Hendron 2020-12-08
10861702 Controlled residence CMP polishing method John Nguyen, Tony Quan Tran, Jeffrey James Hendron 2020-12-08
10777418 Biased pulse CMP groove pattern John Nguyen, Tony Quan Tran, Jeffrey James Hendron 2020-09-15
10586708 Uniform CMP polishing method John Nguyen, Tony Quan Tran, Jeffrey James Hendron 2020-03-10
9802293 Method to shape the surface of chemical mechanical polishing pads Jeffrey James Hendron 2017-10-31
7234224 Curved grooving of polishing pads Steven Naugler, Steven J. Pufka, Weitung Wang 2007-06-26