Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE47275 | Substrate support providing gap height and planarization adjustment in plasma processing chamber | Yen-Kun Wang, John Holland | 2019-03-05 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE47275 | Substrate support providing gap height and planarization adjustment in plasma processing chamber | Yen-Kun Wang, John Holland | 2019-03-05 |