Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8879045 | Method utilizing an electrooptic modulator | Pradeep K. Govil | 2014-11-04 |
| 8013979 | Illumination system with low telecentricity error and dynamic telecentricity correction | Lev Ryzhikov, Roberto B. Wiener, Scott Coston | 2011-09-06 |
| 7876420 | System and method utilizing an electrooptic modulator | Pradeep K. Govil | 2011-01-25 |
| 7525718 | Spatial light modulator using an integrated circuit actuator and method of making and using same | Pradeep K. Govil | 2009-04-28 |
| 7385750 | Spatial light modulator using an integrated circuit actuator | Pradeep K. Govil | 2008-06-10 |
| 7187430 | Advanced illumination system for use in microlithography | Mark Oskotsky, Lev Ryzhikov, Scott Coston, Walter Augustyn | 2007-03-06 |
| 7142353 | System and method utilizing an electrooptic modulator | Pradeep K. Govil | 2006-11-28 |
| 7006198 | System and method for laser beam expansion | Walter Augustyn | 2006-02-28 |
| 6922230 | DUV scanner linewidth control by mask error factor compensation | Pradeep K. Govil | 2005-07-26 |
| 6888615 | System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position | Scott Coston | 2005-05-03 |
| 6819402 | System and method for laser beam expansion | Walter Augustyn | 2004-11-16 |
| 6813003 | Advanced illumination system for use in microlithography | Mark Oskotsky, Lev Ryzhikov, Scott Coston, Walter Augustyn | 2004-11-02 |
| 6784976 | System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control | Scott Coston | 2004-08-31 |
| 6775069 | Advanced illumination system for use in microlithography | Mark Oskotsky, Lev Ryzhikov, Scott Coston, Peter Baumgartner, Walter Augustyn | 2004-08-10 |
| 6573975 | DUV scanner linewidth control by mask error factor compensation | Pradeep K. Govil | 2003-06-03 |
| 6509952 | Method and system for selective linewidth optimization during a lithographic process | Pradeep K. Govil | 2003-01-21 |