Issued Patents All Time
Showing 25 most recent of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6110637 | Photoresists which are suitable for producing sub-micron size structures | Recai Sezi, Rainer Leuschner, Horst Borndoerfer, Michael Sebald, Siegfried Birkle | 2000-08-29 |
| 5973202 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Recai Sezi, Eva Rissel, Kurt Geibel | 1999-10-26 |
| 5922825 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Recai Sezi, Eberhard Kuehn | 1999-07-13 |
| 5883221 | Synthesis of polybenzoxasole and polybenzothiazole precursors | Recai Sezi, Eberhard Kuehn, Sueleyman Kocman | 1999-03-16 |
| 5807969 | Preparation of poly-O-hydroxyamides and poly O-mercaptoamides | Recai Sezi, Eberhard Kuehn, Roland Gestigkeit | 1998-09-15 |
| 5783654 | Preparation of poly-O-hydroxyamides and poly O-mercaptoamides | Recai Sezi | 1998-07-21 |
| 5777066 | Method for the production of poly-o-hydroxyamides | Recai Sezi, Eva Rissel | 1998-07-07 |
| 5760162 | Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides | Recai Sezi, Roland Gestigkeit, Kurt Geibel | 1998-06-02 |
| 5750638 | Method for the production of poly-o-hydroxyamides | Recai Sezi, Roland Gestigkeit | 1998-05-12 |
| 5750711 | Dicarboxylic acid derivatives | Racai Sezi, Eberhard Kuehn | 1998-05-12 |
| 5733706 | Dry-developable positive resist | Recai Sezi, Rainer Leuschner, Horst Borndorfer, Eva Rissel, Michael Sebald +2 more | 1998-03-31 |
| 5726279 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Recai Sezi | 1998-03-10 |
| 5703186 | Mixed polymers | Recai Sezi, Horst Borndoerfer, Siegfried Birkle, Eberhard Kuehn, Rainer Leuschner +2 more | 1997-12-30 |
| 5696218 | Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides | Recai Sezi, Roland Gestigkeit | 1997-12-09 |
| 5688631 | Methods for producing polybenzoxazol precursors and corresponding resist solutions | Recai Sezi, Eva Rissel | 1997-11-18 |
| 5616667 | Copolymers | Recai Sezi, Horst Borndoerfer, Siegfried Birkle, Eberhard Kuehn, Rainer Leuschner +2 more | 1997-04-01 |
| 5556812 | Connection and build-up technique for multichip modules | Rainer Leuschner, Siegfried Birkle, Albert Hammerschmidt, Recai Sezi, Tobias Noll +1 more | 1996-09-17 |
| 5384220 | Production of photolithographic structures | Recai Sezi, Horst Borndoerfer, Rainer Leuschner, Michael Sebald, Siegfried Birkle | 1995-01-24 |
| 5376499 | Highly heat-resistant positive resists comprising end-capped hydroxypolyamides | Albert Hammerschmidt, Siegfried Birkle | 1994-12-27 |
| 5278277 | Phenylquinoxaline copolymers | Lothar Zapf | 1994-01-11 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Recai Sezi, Rainer Leuschner, Michael Sebald, Siegfried Birkle | 1994-01-04 |
| 5262283 | Method for producing a resist structure | Recai Sezi, Horst Borndorfer, Eva Rissel, Rainer Leuschner, Michael Sebald +1 more | 1993-11-16 |
| 5250375 | Photostructuring process | Michael Sebald, Juergen Beck, Rainer Leuschner, Recai Sezi, Siegfried Birkle +1 more | 1993-10-05 |
| 5234794 | Photostructuring method | Michael Sebald, Rainer Leuschner, Recai Sezi, Siegfried Birkle | 1993-08-10 |
| 5234793 | Method for dimensionally accurate structure transfer in bilayer technique wherein a treating step with a bulging agent is employed after development | Michael Sebald, Recai Sezi, Rainer Leuschner, Siegfried Birkle | 1993-08-10 |