Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6803661 | Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography | Reima Laaksonen, Cameron Gross, Eric A. Joseph | 2004-10-12 |
| 6624068 | Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography | Reima Laaksonen, Cameron Gross, Eric A. Joseph | 2003-09-23 |