Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10789576 | Meeting management system | Rachel Katherine Emma Bellamy, Jonathan H. Connell, II, Robert G. Farrell, Brian P. Gaucher, Jonathan Lenchner +1 more | 2020-09-29 |
| 10169716 | Interactive learning | Brian P. Gaucher, Jonathan Lenchner, Valentina Salapura | 2019-01-01 |
| 10095918 | System and method for interpreting interpersonal communication | Dario Gil, Joseph N. Kozhaya, Valentina Salapura | 2018-10-09 |
| 9857676 | Method and program product for designing source and mask for lithography | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2018-01-02 |
| 9760766 | System and method for interpreting interpersonal communication | Dario Gil, Joseph N. Kozhaya, Valentina Salapura | 2017-09-12 |
| 9651856 | Source, target and mask optimization by incorporating contour based assessments and integration over process variations | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2017-05-16 |
| 9395622 | Synthesizing low mask error enhancement factor lithography solutions | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2016-07-19 |
| 9250535 | Source, target and mask optimization by incorporating countour based assessments and integration over process variations | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2016-02-02 |
| 8959462 | Mask design method, program, and mask design system | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2015-02-17 |
| 8954898 | Source-mask optimization for a lithography process | Tadanobu Inoue, Alan E. Rosenbluth, Masaharu Sakamoto, Kehan Tian | 2015-02-10 |
| 8880382 | Analyzing a patterning process using a model of yield | Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, Saibal Mukhopadhyay +3 more | 2014-11-04 |
| 8719735 | Optimizing lithographic mask for manufacturability in efficient manner | Masaharu Sakamoto, Alan E. Rosenbluth, Marc Alan Szeto-Millstone, Tadanobu Inoue, Kehan Tian +2 more | 2014-05-06 |
| 8682634 | Analyzing a patterning process using a model of yield | Saeed Bagheri, Fook-Luen Heng, Rajiv V. Joshi, Kafai Lai, Saibal Mukhopadhyay +3 more | 2014-03-25 |
| 8537444 | System and method for projection lithography with immersed image-aligned diffractive element | Dario Gil, Alan E. Rosenbluth, Kehan Tian, Jaione Tirapu Azpiroz | 2013-09-17 |
| 8539390 | Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge | Tadanobu Inoue, Alan E. Rosenbluth, Kehan Tian, Masaharu Sakamoto | 2013-09-17 |
| 8453076 | Wavefront engineering of mask data for semiconductor device design | Tadanobu Inoue, Hidemasa Muta, Alan E. Rosenbluth, Kehan Tian, Masaharu Sakamoto +1 more | 2013-05-28 |
| 8448098 | Fracturing continuous photolithography masks | Ying Liu, Alan E. Rosenbluth, Kehan Tian | 2013-05-21 |
| 8266554 | Dynamic provisional decomposition of lithographic patterns having different interaction ranges | Saeed Bagheri, Francisco Barahona, Laszlo Ladanyi, Jonathan Lee, Alan E. Rosenbluth +4 more | 2012-09-11 |
| 8266556 | Fracturing continuous photolithography masks | Ying Liu, Alan E. Rosenbluth, Kehan Tian | 2012-09-11 |
| 8234603 | Method for fast estimation of lithographic binding patterns in an integrated circuit layout | Saeed Bagheri, David L. DeMaris, Maria Gabrani, Alan E. Rosenbluth, Kehan Tian | 2012-07-31 |
| 8056023 | Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8056026 | Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masahura Sakamoto, Alan E. Rosenbluth | 2011-11-08 |
| 8028254 | Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale | Tadanobu Inoue, Hidemasa Muta, Kehan Tian, Masaharu Sakamoto, Alan E. Rosenbluth | 2011-09-27 |
| 7969554 | Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images | Alan E. Rosenbluth, Kehan Tian | 2011-06-28 |