| 11693307 |
Reticle pod for preventing haze contamination and reticle stocker having the same |
Jiyong Yoo, BYUNG-IN KWON |
2023-07-04 |
| 8546258 |
Method of fabricating metal contact using double patterning technology and device formed thereby |
Bong-Cheol Kim |
2013-10-01 |
| 8384876 |
Method of detecting reticle errors |
Jin-Seok Heo, Jin Hong Park, Jeong-Ho Yeo |
2013-02-26 |
| 8361905 |
Methods of forming patterns for semiconductor devices |
Bong-Cheol Kim, Hyun-Woo Kim, Young-Moon Choi, Jong-Su Park, Byeong-hwan Son |
2013-01-29 |
| 8241820 |
Photomask used in fabrication of semiconductor device |
Bong-Cheol Kim, Jae-Han Lee, Eun-Sung Kim, Byeong-hwan Son |
2012-08-14 |
| 8227354 |
Method of forming semiconductor device patterns |
Bong-Cheol Kim, Sang-youn Jo, Ja-Min Koo, Byeong-hwan Son, Jang Hwan JEONG |
2012-07-24 |
| 7083899 |
Method for manufacturing a semiconductor device |
Bong-Cheol Kim |
2006-08-01 |
| 6933247 |
Method for forming a minute pattern and method for manufacturing a semiconductor device using the same |
Sung-Hwan Byun, Bong-Cheol Kim |
2005-08-23 |
| 6841338 |
Photoresist composition and method of forming a photoresist pattern with a controlled remnant ratio |
Jeong-Lim Nam, Do-Yul Yoo, Jeung-woo Lee |
2005-01-11 |
| 6818480 |
Method of forming a pattern of a semiconductor device and photomask therefor |
Joon Hee Lee |
2004-11-16 |
| 6673706 |
Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same |
Ji-yong Yoo, Jeung-woo Lee, Suk-Joo Lee, Jae-Han Lee |
2004-01-06 |
| 6620690 |
Method of fabricating flash memory device using self-aligned non-exposure pattern formation process |
Jae-Han Lee |
2003-09-16 |
| 6571384 |
Method of forming fine patterns on semiconductor device |
Hye-Soo Shin, Suk-Joo Lee, Jeung-woo Lee |
2003-05-27 |
| 5667931 |
Positive photoresist composition containing quinone diazide 5-triazine esterification compound |
Ki Dae KIM, Ji-Hong Kim, Seong Ju Kim |
1997-09-16 |
| 5523191 |
Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product |
Seong Ju Kim, Ki Dae KIM, Hosull Lee |
1996-06-04 |
| 5314978 |
Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene |
Seong Ju Kim, Ji-Hong Kim, Seong Geun Jang |
1994-05-24 |
