DH

Daniel Hofman

Applied Materials: 1 patents #4,780 of 7,310Top 70%
Overall (All Time): #3,386,306 of 4,157,543Top 85%
1
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7220937 Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination Jennifer Y. Sun, Senh Thach, Yan Ye 2007-05-22