Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6926589 | Chemical mechanical polishing apparatus and methods using a flexible pad and variable fluid flow for variable polishing | Douglas W. Young, Yuchun Wang | 2005-08-09 |
| 6857947 | Advanced chemical mechanical polishing system with smart endpoint detection | Yuchun Wang, Bernard Frey, Bulent M. Basol, Homayoun Talieh, Douglas W. Young +3 more | 2005-02-22 |