| 9105439 |
Projection lens arrangement |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink |
2015-08-11 |
| 8890094 |
Projection lens arrangement |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink |
2014-11-18 |
| RE45049 |
Electron beam exposure system |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit |
2014-07-29 |
| RE44908 |
Electron beam exposure system |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit |
2014-05-27 |
| RE44240 |
Electron beam exposure system |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit |
2013-05-28 |
| 8089056 |
Projection lens arrangement |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit, Stijn Willem Herman Karel Steenbrink |
2012-01-03 |
| 7091504 |
Electron beam exposure system |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit |
2006-08-15 |
| 6897458 |
Electron beam exposure system |
Marco Jan-Jaco Wieland, Alexander Hendrik Vincent Van Veen, Pieter Kruit |
2005-05-24 |
| 6844560 |
Lithography system comprising a converter plate and means for protecting the converter plate |
Marco Jan-Jaco Wieland, Pieter Kruit |
2005-01-18 |