TH

Thomas Hansen

IBM: 6 patents #16,453 of 70,183Top 25%
Oracle: 2 patents #5,522 of 14,854Top 40%
GA Grundfos Holding A/S: 1 patents #96 of 279Top 35%
TD Transistor Devices: 1 patents #5 of 12Top 45%
Overall (All Time): #400,849 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12025972 Computer implemented system and method for controlling and monitoring a pump Thomas Hoelgaard, Christian Carlsson, Mikkel Haggren Brynildsen 2024-07-02
11924185 Method and system for general data protection compliance via blockchain Alonzo Benavides, Ian Major, Prem Chander Rajamohan, Duygu Gün 2024-03-05
11870842 System and method for dynamic auto-scaling based on roles Ravi Malhotra, Jyotisman Nag 2024-01-09
11368441 Method and system for general data protection compliance via blockchain Alonzo Benavides, Ian Major, Prem Chander Rajamohan, Duygu Gün 2022-06-21
11184432 System and method for dynamic auto-scaling based on roles Ravi Malhotra, Jyotisman Nag 2021-11-23
9077239 Voltage adaptor for AC-DC power supply modules John Santini, Gary Mulcahy 2015-07-07
4726879 RIE process for etching silicon isolation trenches and polycides with vertical surfaces James A. Bondur, Nicholas J. Giammarco, George A. Kaplita, John S. Lechaton 1988-02-23
4589193 Metal silicide channel stoppers for integrated circuits and method for making the same George R. Goth, Robert T. Villetto, Jr. 1986-05-20
4549927 Method of selectively exposing the sidewalls of a trench and its use to the forming of a metal silicide substrate contact for dielectric filled deep trench isolated devices George R. Goth, James S. Makris 1985-10-29
4541168 Method for making metal contact studs between first level metal and regions of a semiconductor device compatible with polyimide-filled deep trench isolation schemes John R. Galie, George R. Goth, Robert T. Villetto, Jr. 1985-09-17
4534826 Trench etch process for dielectric isolation George R. Goth, Robert T. Villetto, Jr. 1985-08-13
4229233 Method for fabricating non-reflective semiconductor surfaces by anisotropic reactive ion etching Claude Johnson, Jr., Robert R. Wilbarg 1980-10-21