Issued Patents All Time
Showing 51–61 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6813116 | Magnetic heads for perpendicular recording and magnetic recording disk apparatus using the same | Atsushi Nakamura, Masafumi Mochizuki, Kimitoshi Etoh, Isao Nunokawa, Yoshiaki Kawato | 2004-11-02 |
| 6809908 | Light induction type thin film magnetic head | Kenchi Ito, Hideki Saga, Hiroaki Nemoto | 2004-10-26 |
| 6785097 | Thin film magnetic recording head, method of fabricating the thin film magnetic recording head and magnetic disk drive | Yoshiaki Kawato, Kaori Suzuki, Hiroshi Fukui, Isao Nunokawa | 2004-08-31 |
| 6741421 | Magnetic head for perpendicular recording and magnetic disk storage apparatus mounting the head | Masafumi Mochizuki, Atsushi Nakamura | 2004-05-25 |
| 6710973 | Single pole type recording head including tapered edges | Yoshiaki Kawato, Yasutaka Nishida, Yasuo Wakaki, Masafumi Mochizuki, Hisashi Takano | 2004-03-23 |
| 6530141 | Method of forming thin film magnetic recording head with narrow track width performing high density recording at high driving frequency | Matahiro Komuro, Moriaki Fuyama, Tetsuo Ito, Hiroshi Fukui, Yohji Maruyama +2 more | 2003-03-11 |
| 6491832 | Method for processing specimens | Ken Yoshioka, Yoshimi Torii, Moriaki Fuyama, Saburou Kanai, Takehito Usui +1 more | 2002-12-10 |
| 6483663 | Thin film magnetic head and magnetic disk apparatus including the same | Tetsuya Okai, Shinobu Sasaki, Tadayuki Iwakura, Naoki Koyama, Takashi Kawabe +2 more | 2002-11-19 |
| 6091582 | Thin film magnetic recording head with very narrow track width performing high density recording at high driving frequency | Matahiro Komuro, Moriaki Fuyama, Tetsuo Ito, Hiroshi Fukui, Yohji Maruyama +2 more | 2000-07-18 |
| 6034847 | Apparatus and thin film magnetic head with magnetic membrane layers of different resistivity | Matahiro Komuro, Masaaki Sano, Moriaki Fuyama, Hiroshi Fukui, Katsumi Hoshino +6 more | 2000-03-07 |
| 5777702 | Liquid crystal display device and method of fabricating the same by patterning semiconductor, insulator, and gatelines with single mask | Masatoshi Wakagi, Kenichi Onisawa, Masahiko Ando, Toshiki Kaneko, Tetsuroh Minemura | 1998-07-07 |