Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10796921 | CMP fluid and method for polishing palladium | Hisataka Minami, Jin Amanokura, Yuuhei Okada, Hiroshi Ono | 2020-10-06 |
| 8900473 | Polishing solution for CMP, and method for polishing substrate using the polishing solution for CMP | Hisataka Minami, Hiroshi Ono | 2014-12-02 |