Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9741847 | Methods of forming a contact structure for a vertical channel semiconductor device and the resulting device | — | 2017-08-22 |
| 9716177 | Semiconductor device comprising a multi-layer channel region | Behtash Behin-Aein, Mehdi Salmani-Jelodar | 2017-07-25 |
| 9711644 | Methods of making source/drain regions positioned inside U-shaped semiconductor material using source/drain placeholder structures | — | 2017-07-18 |
| 9704962 | Horizontal gate all around nanowire transistor bottom isolation | — | 2017-07-11 |
| 9698262 | Vertical fin field-effect semiconductor device | Geert Eneman | 2017-07-04 |
| 9653593 | Method of fabricating FinFET device and structure thereof | — | 2017-05-16 |
| 9601379 | Methods of forming metal source/drain contact structures for semiconductor devices with gate all around channel structures | Dmitry Yakimets, Pieter Schuddinck | 2017-03-21 |
| 9558943 | Stress relaxed buffer layer on textured silicon surface | — | 2017-01-31 |
| 9419154 | Interdigitated electrode formation | Bartlomiej Sojka | 2016-08-16 |
| 9368578 | Methods of forming substrates comprised of different semiconductor materials and the resulting device | Steven Bentley, Ajey Poovannummoottil Jacob | 2016-06-14 |
| 9263555 | Methods of forming a channel region for a semiconductor device by performing a triple cladding process | Behtash Behin-Aein, Mehdi Salmani-Jelodar | 2016-02-16 |
| 9166025 | Methods of forming a nanowire device with a gate-all-around-channel configuration and the resulting nanowire device | — | 2015-10-20 |
| 9076842 | Fin pitch scaling and active layer isolation | Ajey Poovannummoottil Jacob, Murat Kerem Akarvardar, Steven Bentley | 2015-07-07 |
| 8900891 | Fabrication method for interdigitated back contact photovoltaic cells | Tom Janssens | 2014-12-02 |
| 8716156 | Methods of forming fins for a FinFET semiconductor device using a mandrel oxidation process | Steven Bentley, Ajey Poovannummoottil Jacob | 2014-05-06 |
| 8357595 | Semiconductor substrate with solid phase epitaxial regrowth with reduced depth of doping profile and method of producing same | — | 2013-01-22 |
| 8357569 | Method of fabricating finfet device | — | 2013-01-22 |
| 8187959 | Semiconductor substrate with solid phase epitaxial regrowth with reduced junction leakage and method of producing same | Raymond James Duffy, Richard Lindsay | 2012-05-29 |
| 8183116 | Method of manufacturing a double gate transistor | — | 2012-05-22 |
| 7790545 | Semiconductor device having a polysilicon electrode including amorphizing, recrystallising, and removing part of the polysilicon electrode | — | 2010-09-07 |
| 7785993 | Method of growing a strained layer | Philippe Meunier-Beillard | 2010-08-31 |
| 7615430 | Field effect transistor and method of manufacturing a field effect transistor | — | 2009-11-10 |
| 7582547 | Method for junction formation in a semiconductor device and the semiconductor device made thereof | — | 2009-09-01 |
| 7491616 | Method of manufacturing a semiconductor device including dopant introduction | — | 2009-02-17 |
| 7348229 | Method of manufacturing a semiconductor device and semiconductor device obtained with such a method | Raymond James Duffy | 2008-03-25 |