Issued Patents All Time
Showing 26–35 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4513026 | Method for coating a semiconductor device with a phosphosilicate glass | Hidekazu Miyamoto, Yoshimi Shioya, Mamoru Maeda | 1985-04-23 |
| 4503315 | Semiconductor device with fuse | Hajime Kamioka, Noriaki Sato, Motoo Nakano, Takashi Iwai | 1985-03-05 |
| 4487787 | Method of growing silicate glass layers employing chemical vapor deposition process | Yoshimi Shioya | 1984-12-11 |
| 4412388 | Method for drying semiconductor substrates | Hajime Kamioka | 1983-11-01 |
| 4394401 | Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film | Yoshimi Shioya, Mamoru Maeda, Kanetake Takasaki | 1983-07-19 |
| 4293589 | Process for high pressure oxidation of silicon | Mamoru Maeda, Hajime Kamioka | 1981-10-06 |
| 4293590 | Process for high pressure oxidation of silicon | Mamoru Maeda, Hajime Kamioka | 1981-10-06 |
| 4275094 | Process for high pressure oxidation of silicon | Mamoru Maeda, Hajime Kamioka | 1981-06-23 |
| 4263087 | Process for producing epitaxial layers | Kaoru Tanabe, Yoshifumi Nomura, Mamoru Maeda | 1981-04-21 |
| 4210473 | Process for producing a semiconductor device | Hajime Kamioka, Haruo Shimoda, Hidekazu Miyamoto | 1980-07-01 |