Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6455628 | Two component dispersant for wet milling process | Sheau-Hwa Ma | 2002-09-24 |
| 6306994 | Inks with enhanced substrate binding characteristics | Dennis S. Donald, Sheau-Hwa Ma | 2001-10-23 |
| 5654354 | Compositions for diffusion patterning | John James Felten, Sheau-Hwa Ma | 1997-08-05 |
| 5648405 | Aqueous ink jet inks | Sheau-Hwa Ma | 1997-07-15 |
| 5609914 | Method for preparing high resolution polyimide images using non-photosensitive layers of poly(amic acid) or salts thereof | Sheau-Hwa Ma, Howard E. Simmons, III | 1997-03-11 |
| 5519085 | Aqueous dispersions containing ABC triblock polymer dispersants | Sheau-Hwa Ma, Ira B. Dicker | 1996-05-21 |
| 5286595 | Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation | Howard E. Simmons, III, Mario Grossa | 1994-02-15 |
| 5275689 | Method and compositions for diffusion patterning | John James Felten, Sheau-Hwa Ma | 1994-01-04 |
| 5272201 | Amine-containing block polymers for pigmented ink jet inks | Sheau-Hwa Ma, Harry J. Spineli, Arthur C. Shor | 1993-12-21 |
| 5262281 | Resist material for use in thick film resists | Richard Bauer, Gwendyline Y. Y. Chen, Robert Clayton Wheland | 1993-11-16 |
| 5229244 | Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation | Howard E. Simmons, III | 1993-07-20 |
| 5219711 | Positive image formation utilizing resist material with carbazole diazonium salt acid generator | Albert G. Anderson, Robert Clayton Wheland, Yuan Chen | 1993-06-15 |
| 5219945 | ABC triblock methacrylate polymers | Ira B. Dicker, Sheau-Hwa Ma | 1993-06-15 |
| 5212047 | Resist material and process for use | Dotsevi Y. Sogah, Gary N. Taylor | 1993-05-18 |
| 5206317 | Resist material and process for use | Dotsevi Y. Sogah, Gary N. Taylor | 1993-04-27 |
| 5145764 | Positive working resist compositions process of exposing, stripping developing | Richard Bauer, Gwendyline Y. Y. Chen, Robert Clayton Wheland | 1992-09-08 |
| 5120633 | Resist material for use in thick film resists | Richard Bauer, Gwendyline Y. Y. Chen, Robert Clayton Wheland | 1992-06-09 |
| 5093221 | Process of making colored images using aqueous processable photosensitive elements | Gwendyline Y. Y. Chen, Floyd A. Raymond, Jeffrey Jude Patricia | 1992-03-03 |
| 5077174 | Positive working dry film element having a layer of resist composition | Richard Bauer, Gwendyline Y. Y. Chen, Robert Clayton Wheland | 1991-12-31 |
| 5071731 | Aqueous processable photosensitive element with an elastomeric layer | Gwendyline Y. Y. Chen, Floyd A. Raymond, Jeffrey Jude Patricia | 1991-12-10 |
| 5072029 | Catalyzed process for reacting carboxylic acids with vinyl ethers | — | 1991-12-10 |
| 5021524 | Initiator for group transfer polymerization | Ira B. Dicker | 1991-06-04 |
| 5019634 | Group transfer living polymer grafted to an initiator support | Fritz P. Boettcher, Ira B. Dicker, Richard C. Ebersole | 1991-05-28 |
| 4985332 | Resist material with carbazole diazonium salt acid generator and process for use | Albert G. Anderson, Robert Clayton Wheland, Yuan Chen | 1991-01-15 |
| 4978723 | Phosphonate-capped polymers | — | 1990-12-18 |