GC

Gwendyline Y. Y. Chen

EA E.I. Du Pont De Nemours And: 11 patents #640 of 8,010Top 8%
📍 Wilmington, DE: #432 of 3,182 inventorsTop 15%
🗺 Delaware: #850 of 7,163 inventorsTop 15%
Overall (All Time): #474,656 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
5262281 Resist material for use in thick film resists Richard Bauer, Walter R. Hertler, Robert Clayton Wheland 1993-11-16
5252427 Positive photoresist compositions Richard Bauer, William Larry Hamilton 1993-10-12
5145764 Positive working resist compositions process of exposing, stripping developing Richard Bauer, Walter R. Hertler, Robert Clayton Wheland 1992-09-08
5120633 Resist material for use in thick film resists Richard Bauer, Walter R. Hertler, Robert Clayton Wheland 1992-06-09
5093221 Process of making colored images using aqueous processable photosensitive elements Floyd A. Raymond, Jeffrey Jude Patricia, Walter R. Hertler 1992-03-03
5077174 Positive working dry film element having a layer of resist composition Richard Bauer, Walter R. Hertler, Robert Clayton Wheland 1991-12-31
5071731 Aqueous processable photosensitive element with an elastomeric layer Floyd A. Raymond, Jeffrey Jude Patricia, Walter R. Hertler 1991-12-10
4423135 Preparation of photosensitive block copolymer elements James Brennan 1983-12-27
4369246 Process of producing an elastomeric printing relief James Brennan 1983-01-18
4323636 Photosensitive block copolymer composition and elements 1982-04-06
4323637 Use of cover sheet and interposed flexible film with block copolymer composition James Brennan 1982-04-06