CW

Cormac Walsh

EI Ebara Technologies Incorporated: 1 patents #7 of 16Top 45%
MI Multiplanar Technologies Incorporated: 1 patents #7 of 11Top 65%
Overall (All Time): #2,174,050 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
7125326 Apparatus and method for removing a CMP polishing pad from a platen Jun Liu, Gerard Moloney, A. Ernesto Saldana 2006-10-24
6887132 Slurry distributor for chemical mechanical polishing apparatus and method of using the same Jiro Kajiwara, Gerard Moloney, Jun Liu, Junsheng Yang, Ernesto Saldana +1 more 2005-05-03