TI

Tetsuya Ikuta

DC Dowa Electronics Materials Co.: 25 patents #3 of 241Top 2%
NG Nihon Shinku Gijutsu: 4 patents #12 of 128Top 10%
SO Sony: 4 patents #8,966 of 25,231Top 40%
TO Toyota: 4 patents #6,703 of 26,838Top 25%
Nichia: 3 patents #567 of 1,531Top 40%
NK Nihon Sinku Gijutsu Kabusiki: 2 patents #5 of 21Top 25%
📍 Miyoshi, JP: #44 of 2,464 inventorsTop 2%
Overall (All Time): #81,046 of 4,157,543Top 2%
39
Patents All Time

Issued Patents All Time

Showing 26–39 of 39 patents

Patent #TitleCo-InventorsDate
8049248 Semiconductor device including thyristor and method of manufacturing the same 2011-11-01
7956536 Light emitting device and method for producing same Tsukasa Maruyama, Masahiro Gotoh 2011-06-07
7878876 Light emitting device and method for producing same Tsukasa Maruyama, Masahiro Gotoh 2011-02-01
7812516 Light-emitting device and manufacturing method thereof Tsukasa Maruyama 2010-10-12
7803286 Phosphor and manufacturing method for the same, and light source Kenji Sakane, Akira Nagatomi, Masahiro Gotoh, Shuji Yamashita 2010-09-28
7531389 Method of manufacturing semiconductor device 2009-05-12
7476336 Phosphor and manufacturing method for the same, and light emitting device using the phosphor Akira Nagatomi, Shuji Yamashita 2009-01-13
7476338 Phosphor and manufacturing method for the same, and light source Kenji Sakane, Akira Nagatomi, Masahiro Gotoh, Shuji Yamashita 2009-01-13
5851589 Method for thermal chemical vapor deposition Izumi Nakayama, Akitoshi Suzuki, Yoshiro Kusumoto, Kazuo Takakuwa 1998-12-22
5244501 Apparatus for chemical vapor deposition Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto +1 more 1993-09-14
4994301 ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate Yoshiro Kusumoto, Kazuo Takakuwa, Akitoshi Suzuki, Izumi Nakayama 1991-02-19
4924807 Apparatus for chemical vapor deposition Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto +1 more 1990-05-15
4849260 Method for selectively depositing metal on a substrate Yoshiro Kusumoto, Kazuo Takakuwa, Akitoshi Suzuki, Izumi Nakayama 1989-07-18
4800105 Method of forming a thin film by chemical vapor deposition Izumi Nakayama, Akitoshi Suzuki, Yoshiro Kusumoto, Kazuo Takakuwa 1989-01-24