Issued Patents All Time
Showing 51–75 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6692548 | Copper-based sliding material, method of manufacturing the same, and sliding bearing | Naohisa Kawakami, Satoru Kurimoto, Takashi Inaba, Koichi Yamamoto, Takayuki Shibayama | 2004-02-17 |
| 6679929 | Polishing composition and polishing method employing it | Hiroshi Asano, Katsuyoshi Ina | 2004-01-20 |
| 6652675 | Copper alloy sliding material | Naohisa Kawakami, Satoru Kurimoto, Koichi Yamamoto, Takayuki Shibayama | 2003-11-25 |
| 6602615 | Composite sliding material | Eisaku Inoue, Satoru Kurimoto, Koichi Yamamoto, Takayuki Shibayama | 2003-08-05 |
| 6582269 | Lamp apparatus and lamp apparatus manufacturing method | Sumio Hashimoto, Hisao Hosoya, Masaaki Komiya | 2003-06-24 |
| 6565619 | Polishing composition and polishing method employing it | Hiroshi Asano, Katsuyoshi Ina | 2003-05-20 |
| 6492771 | Bulb and a method for welding a pipe and a conductive wire thereof | Hirosumi Cho | 2002-12-10 |
| 6475635 | Sliding material made of copper alloy, method of producing same, and sliding bearing | Naohisa Kawakami, Satoru Kurimoto, Takashi Inaba, Koichi Yamamoto, Takayuki Shibayama | 2002-11-05 |
| 6476262 | Urea synthesis process and apparatus | Tadashi Fukunaka, Kenji Yoshimoto, Yasuhiko Kojima | 2002-11-05 |
| 6440186 | Polishing composition and polishing method employing it | Hiroshi Asano, Tadahiro Kitamura, Katsuyoshi Ina | 2002-08-27 |
| 6402589 | Wafer grinder and method of detecting grinding amount | Takao Inaba, Minoru Numoto | 2002-06-11 |
| 6354914 | Wafer polishing apparatus | Takao Inaba, Minoru Numoto, Manabu Satoh | 2002-03-12 |
| 6346037 | Wafer polishing machine | Takao Inaba, Minoru Numoto | 2002-02-12 |
| 6334914 | Copper alloy sliding material | Naohisa Kawakami, Satoru Kurimoto, Takashi Inaba, Koichi Yamamoto, Takayuki Shibayama | 2002-01-01 |
| 6302762 | Wafer polishing apparatus | Takao Inaba, Minoru Numoto, Manabu Satoh | 2001-10-16 |
| 6203414 | Polishing apparatus | Minoru Numoto, Takao Inaba, Hisashi Terashita, Manabu Satoh | 2001-03-20 |
| 6187853 | Process for the preparation of dispersions using viscosity-increase inhibitors of water-soluble polymers | Hisao Takeda, Takumi Ohara, Mika Suzuki | 2001-02-13 |
| 6059636 | Wafer polishing apparatus | Takao Inaba, Minoru Numoto, Manabu Satoh | 2000-05-09 |
| 6027398 | Wafer polishing apparatus | Minoru Numoto, Manabu Satoh, Hisashi Terashita | 2000-02-22 |
| 5931725 | Wafer polishing machine | Takao Inaba, Masaaki Oguri, Minoru Numoto, Hisashi Terashita | 1999-08-03 |
| 5922640 | Adsorbent for carbon monoxide | Hidefumi Hirai, Nobutoshi Ootsuka, Toshiyuki Shimazawa | 1999-07-13 |
| 5876272 | Semiconductor wafer polishing machine | Takao Inaba, Masaaki Oguri | 1999-03-02 |
| 5607703 | Roller head extruder unit | Yoshihiro Hamada, Katsunobu Hagiwara, Toshio Ujihara, Toshio Yanagihara, Hiromi Nakano | 1997-03-04 |
| 5460737 | Graphite-free lubricating oil | Koichi Goto, Hitoshi Yokomizo, Kazuhiro Mitamura, Toshinori Kawai, Masatoshi Hirofuji | 1995-10-24 |
| 5402230 | Heterodyne interferometric optical fiber displacement sensor for measuring displacement of an object | Qian Tian, Enyao Zhang, Donglei Tang, Akira Shimokohbe, Masahiro Akahane | 1995-03-28 |