JF

Jeffrey S. Flynn

CR Cree: 13 patents #129 of 639Top 25%
AC Advanced Technology & Materials Co.: 3 patents #122 of 410Top 30%
📍 Litchfield, CT: #3 of 81 inventorsTop 4%
🗺 Connecticut: #2,703 of 34,797 inventorsTop 8%
Overall (All Time): #299,278 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Showing 1–16 of 16 patents

Patent #TitleCo-InventorsDate
8698286 High voltage switching devices and process for forming same George R. Brandes, Robert P. Vaudo 2014-04-15
8390101 High voltage switching devices and process for forming same George R. Brandes, Robert P. Vaudo 2013-03-05
8212259 III-V nitride homoepitaxial material of improved quality formed on free-standing (Al,In,Ga)N substrates George R. Brandes, Robert P. Vaudo, David Keogh, Xueping Xu, Barbara E. Landini 2012-07-03
8174089 High voltage switching devices and process for forming same George R. Brandes, Robert P. Vaudo 2012-05-08
8043731 Vicinal gallium nitride substrate for high quality homoepitaxy Xueping Xu, Robert P. Vaudo, George R. Brandes 2011-10-25
7919791 Doped group III-V nitride materials, and microelectronic devices and device precursor structures comprising same George R. Brandes 2011-04-05
7915152 III-V nitride substrate boule and method of making and using the same Robert P. Vaudo, George R. Brandes, Joan M. Redwing, Michael A. Tischler 2011-03-29
7795707 High voltage switching devices and process for forming same George R. Brandes, Robert P. Vaudo 2010-09-14
7700203 Vicinal gallium nitride substrate for high quality homoepitaxy Xueping Xu, Robert P. Vaudo, George R. Brandes 2010-04-20
7655197 III-V nitride substrate boule and method of making and using the same Robert P. Vaudo, George R. Brandes, Joan M. Redwing, Michael A. Tischler 2010-02-02
7390581 Vicinal gallium nitride substrate for high quality homoepitaxy Xueping Xu, Robert P. Vaudo, George R. Brandes 2008-06-24
7282744 III-nitride optoelectronic device structure with high Al AlGaN diffusion barrier Huoping Xin, George R. Brandes 2007-10-16
7118813 Vicinal gallium nitride substrate for high quality homoepitaxy Xueping Xu, Robert P. Vaudo, George R. Brandes 2006-10-10
6596079 III-V nitride substrate boule and method of making and using the same Robert P. Vaudo, George R. Brandes, Joan M. Redwing, Michael A. Tischler 2003-07-22
6533874 GaN-based devices using thick (Ga, Al, In)N base layers Robert P. Vaudo, Joan M. Redwing, Michael A. Tischler, Duncan W. Brown 2003-03-18
6447604 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((AL,IN,GA)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES George R. Brandes, Robert P. Vaudo, David Keogh, Xueping Xu, Barbara E. Landini 2002-09-10