Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8263321 | Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Chang Il Oh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2012-09-11 |
| 8088301 | Epoxy compound for liquid crystal photo-alignment agent, liquid crystal photo-alignment agent, and liquid crystal photo-alignment film | Jae-Deuk Yang, Tae-Hyoung Kwak, Hyo-Ju SEO | 2012-01-03 |
| 8057700 | Liquid crystal photo-alignment agent and liquid crystal photo-alignment film and liquid crystal display including the same | Jae Min Oh, Jae-Deuk Yang, Tae-Hyoung Kwak | 2011-11-15 |
| 8034261 | Anisotropic conductive film composition, anisotropic conductive film including the same, and associated methods | Hyoun Young Kim, Jeong Ku Kang, Young-Hoon Kim, Jae Sun Han, Ja Young HWANG +2 more | 2011-10-11 |
| 7981594 | Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same | Kyong Ho Yoon, Jong-seob Kim, Hwan-Sung Cheon, Chang Il Oh, Min Soo Kim +1 more | 2011-07-19 |
| 7879526 | Hardmask compositions for resist underlayer films | Chang Il Oh, Do-Hyeon Kim, Hui-Chan Yun, Jin Kuk Lee, Irina Nam +1 more | 2011-02-01 |
| 7862990 | Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Chang Il Oh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2011-01-04 |
| 7829638 | Antireflective hardmask composition and methods for using same | Chang Il Oh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam | 2010-11-09 |
| 7659051 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Chang Il Oh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2010-02-09 |
| 7655386 | Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device | Kyung-Hee HYUNG, Jong-seob Kim, Chang Il Oh, Kyong Ho Yoon, Min Soo Kim +1 more | 2010-02-02 |
| 7629260 | Organosilane hardmask compositions and methods of producing semiconductor devices using the same | Hui-Chan Yun, Jin Kuk Lee, Chang Il Oh, Jong-seob Kim, Sang Kyun Kim +1 more | 2009-12-08 |
| 7514199 | Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same | Chang Il Oh, Do-Hyeon Kim, Hui-Chan Yun, Jin Kuk Lee, Irina Nam +1 more | 2009-04-07 |
| 7405029 | Antireflective hardmask composition and methods for using same | Chang Il Oh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam, Hui-Chan Yun +1 more | 2008-07-29 |
| 7378217 | Antireflective hardmask composition and methods for using same | Chang Il Oh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam, Hui-Chan Yun +1 more | 2008-05-27 |