Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8999862 | Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby | Keun Do Ban, Cheol Kyu Bok, Myoung Soo Kim, Jung Hyung Lee, Hyun Kyung Shim | 2015-04-07 |
| 8445187 | Hardmask composition having antireflective properties and method of patterning material on substrate using the same | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Hwan-Sung Cheon, Min Soo Kim +1 more | 2013-05-21 |
| 8420289 | Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods | Min Soo Kim, Dong Seon Uh, Kyong Ho Yoon, Kyung-Hee HYUNG, Jin Kuk Lee +4 more | 2013-04-16 |
| 8263321 | Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2012-09-11 |
| 7981594 | Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Hwan-Sung Cheon, Min Soo Kim +1 more | 2011-07-19 |
| 7879526 | Hardmask compositions for resist underlayer films | Dong Seon Uh, Do-Hyeon Kim, Hui-Chan Yun, Jin Kuk Lee, Irina Nam +1 more | 2011-02-01 |
| 7862990 | Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2011-01-04 |
| 7829638 | Antireflective hardmask composition and methods for using same | Dong Seon Uh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam | 2010-11-09 |
| 7659051 | Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Kyung-Hee HYUNG, Min Soo Kim +1 more | 2010-02-09 |
| 7655386 | Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device | Kyung-Hee HYUNG, Jong-seob Kim, Dong Seon Uh, Kyong Ho Yoon, Min Soo Kim +1 more | 2010-02-02 |
| 7632622 | Antireflective hardmask composition and methods for using same | Dong Sun Uh, Ji Young Jung, Jae Min Oh, Do-Hyeon Kim | 2009-12-15 |
| 7629260 | Organosilane hardmask compositions and methods of producing semiconductor devices using the same | Dong Seon Uh, Hui-Chan Yun, Jin Kuk Lee, Jong-seob Kim, Sang Kyun Kim +1 more | 2009-12-08 |
| 7514199 | Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same | Dong Seon Uh, Do-Hyeon Kim, Hui-Chan Yun, Jin Kuk Lee, Irina Nam +1 more | 2009-04-07 |
| 7405029 | Antireflective hardmask composition and methods for using same | Dong Seon Uh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam, Hui-Chan Yun +1 more | 2008-07-29 |
| 7378217 | Antireflective hardmask composition and methods for using same | Dong Seon Uh, Do-Hyeon Kim, Jin Kuk Lee, Irina Nam, Hui-Chan Yun +1 more | 2008-05-27 |
| 7112795 | Method of controlling metallic layer etching process and regenerating etchant for metallic layer etching process based on near infrared spectrometer | Ki-Beom Lee, Mi Sun Park, Jong Min Kim, Byung-Uk Kim | 2006-09-26 |
| 7015183 | Resist remover composition | Ji-Hum Baik, Chong-Soon Yoo | 2006-03-21 |
| 6908892 | Photoresist remover composition | Suk-Il Yoon, Young-Woong Park, Sang-Dai Lee, Chong-Soon Yoo | 2005-06-21 |
| 6861210 | Resist remover composition | Ji-Hum Baik, Chong-Soon Yoo | 2005-03-01 |
| 6774097 | Resist stripper composition | Suk-Il Yoon, Young-Woong Park, Sang-Dai Lee, Chong-Soon Yoo | 2004-08-10 |
| 6683034 | Stripper composition for negative chemically amplified resist | Sang-Dai Lee, Chong-Soon Yoo | 2004-01-27 |
| 6579668 | Photoresist remover composition | Ji-Hum Baik, Sang-Dai Lee, Chong-Soon Yoo | 2003-06-17 |
| 6183942 | Thinner composition for removing spin-on-glass and photoresist | Byung-Uk Kim, Ji-Hum Baik, Sang-Dai Lee, Won-Lae Kim, Chong-Soon Yoo | 2001-02-06 |
| 6140027 | Photoresist remover composition | Ji-Hum Baik, Sang-Dai Lee, Won-Lae Kim, Chong-Soon Yoo | 2000-10-31 |