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Preparation method for an electroconductive patterned copper layer |
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2013-03-12 |
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Method of depositing titanium nitride thin film and CVD deposition apparatus |
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2002-10-29 |
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Method of depositing titanium nitride thin film and CVD deposition apparatus |
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2000-06-27 |
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Titanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gas |
Hitoshi Jimba, Atsushi Sekiguchi |
1997-09-30 |
