Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6058945 | Cleaning methods of porous surface and semiconductor surface | Hideya Kumomi | 2000-05-09 |
| 5754344 | Head-mounted stereoscopic image display apparatus | — | 1998-05-19 |
| 5458755 | Anodization apparatus with supporting device for substrate to be treated | Mitsuhiro Ishii, Senju Kanbe, Takao Yonehara, Toru Takisawa, Akira Okita +3 more | 1995-10-17 |
| 5038712 | Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process | — | 1991-08-13 |
| 4958185 | Photographing apparatus | Osamu Kamiya | 1990-09-18 |
| 4909184 | Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process | — | 1990-03-20 |
| 4909183 | Apparatus for plasma CVD | Osamu Kamiya | 1990-03-20 |
| 4732792 | Method for treating surface of construction material for vacuum apparatus, and the material treated thereby and vacuum treatment apparatus having the treated material | — | 1988-03-22 |
| 4719873 | Film forming apparatus | — | 1988-01-19 |
| 4709656 | Layer forming apparatus | — | 1987-12-01 |
| 4666734 | Apparatus and process for mass production of film by vacuum deposition | Osamu Kamiya, Keijiro Nishida, Kyosuke Ogawa | 1987-05-19 |
| 4648348 | Plasma CVD apparatus | — | 1987-03-10 |
| 4646681 | Gaseous phase method accumulated film manufacturing apparatus | — | 1987-03-03 |
| 4637342 | Vacuum processing apparatus | Osamu Kamiya, Kyosuke Ogawa, Takashi Kurokawa | 1987-01-20 |
| 4633812 | Vacuum plasma treatment apparatus | — | 1987-01-06 |
| 4599971 | Vapor deposition film forming apparatus | Shotaro Okabe | 1986-07-15 |
| 4545328 | Plasma vapor deposition film forming apparatus | Shotaro Okabe | 1985-10-08 |
| 4539934 | Plasma vapor deposition film forming apparatus | Shotaro Okabe | 1985-09-10 |
| 4529474 | Method of cleaning apparatus for forming deposited film | Osamu Kamiya | 1985-07-16 |
| 4526644 | Treatment device utilizing plasma | Osamu Kamiya | 1985-07-02 |