Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5016332 | Plasma reactor and process with wafer temperature control | Janice McOmber, Andrew P. Ryan, John Davies | 1991-05-21 |
| 4380488 | Process and gas mixture for etching aluminum | Diane C. Vogel, Marian C. Tang | 1983-04-19 |
| 4324611 | Process and gas mixture for etching silicon dioxide and silicon nitride | Diane C. Vogel, Marian C. Tang | 1982-04-13 |
| 4313783 | Computer controlled system for processing semiconductor wafers | John Davies | 1982-02-02 |