| 5550397 |
Metal oxide semiconductor transistors having a polysilicon gate electrode with nonuniform doping in source-drain direction |
Serge Luryi |
1996-08-27 |
| 5407532 |
Self-aligned method of fabrication closely spaced apart metallization lines |
San-Chin Fang |
1995-04-18 |
| 5166091 |
Fabrication method in vertical integration |
Ronald J. Schutz |
1992-11-24 |
| 5149672 |
Process for fabricating integrated circuits having shallow junctions |
Ronald J. Schutz |
1992-09-22 |
| 4978915 |
Method of manufacturing semiconductor devices involving the detection of impurities |
John M. Andrews, Gerald Smolinsky |
1990-12-18 |
| 4938847 |
Method of manufacturing semiconductor devices, involving the detection of water |
John M. Andrews, Gerald Smolinsky |
1990-07-03 |
| 4450620 |
Fabrication of MOS integrated circuit devices |
Ellis N. Fuls, Sheila Vaidya |
1984-05-29 |
| 4333793 |
High-selectivity plasma-assisted etching of resist-masked layer |
Joseph M. Moran, David N. Wang |
1982-06-08 |