JP

Jens Palm

AD Atotech Deutschland: 4 patents #45 of 445Top 15%
Overall (All Time): #1,112,758 of 4,157,543Top 30%
4
Patents All Time

Issued Patents All Time

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
12071702 Acidic aqueous composition for electrolytic copper plating Kun SI, Ralf Schmidt, Onas Bolton, Josef Gaida, Frank Von Horsten +4 more 2024-08-27
12054843 Acidic aqueous composition for electrolytically depositing a copper deposit Ralf Schmidt, Josef Gaida, Willi Rohland, Himendra Jha 2024-08-06
11035051 Acidic aqueous composition for electrolytic copper plating Kun SI, Ralf Schmidt, Onas Bolton, Josef Gaida, Frank Von Horsten +4 more 2021-06-15
10633755 Copper plating bath composition and method for deposition of copper Dirk Rohde 2020-04-28